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Products

Our product portfolio covers five series — sapphire, silicon carbide, monocrystalline silicon, fused quartz and alumina ceramics — with specifications representing stable batch-production levels. For non-standard requirements, sample slicing is available first and pricing is confirmed against measured data.

01 · Sapphire

Sapphire wafers & substrates

High-purity sapphire crystals (>5N) grown by the Kyropoulos method, processed into C-plane (0001) wafers, 310 × 310 mm substrates and optical windows with an orientation tolerance of ±2°, double-side CMP polishing and surface roughness Ra ≤ 0.3 μm. Primary applications: LED substrates and optical windows.

  • Ingots up to 12 in; wafers and sheets 2–6 in
  • 310 × 310 mm square sheet within ±0.2 mm
  • Transmission above 70 % at 355 nm and 1,064 nm
Sapphire — published specifications
MaterialSingle-crystal Al₂O₃, Kyropoulos
Purity> 5N
OrientationC-plane (0001), offcut ±2°
Diameter2 in / 4 in / 6 in
Square sheet310 × 310 mm ±0.2 mm
Thickness700 / 1,000 μm ±3 μm
Surface finishRa ≤ 0.3 μm, CMP both faces
Transmission> 70 % @ 355 nm & 1,064 nm
TTV / bowPer sample

Silicon carbide — published specifications
Material4H-SiC, PVT grown
Diameter6 in / 8 in
Thickness350 / 500 μm
GradeN-type · semi-insulating
Orientation4° off-axis (0001) toward [11-20]
FacesSi-face polished, C-face ground or polished
Surface finishRa ≤ 0.3 μm
TTV / bow / warpPer sample
NoteValues confirmed on trial slices before quoting
02 · Silicon carbide

SiC substrates

6-inch and 8-inch 4H-SiC substrates in conductive and semi-insulating grades. Conductive substrates suit power devices such as MOSFETs and Schottky diodes; semi-insulating substrates suit RF and HEMT devices. Available as ground or polished wafers; TTV, warp and other parameters are agreed with the customer and verified by measurement.

  • N-type and semi-insulating grades
  • Sliced on the same multi-wire line as sapphire
  • Trial slices available before a volume order

03 · Monocrystalline silicon

Silicon wafers

6/8/12-inch monocrystalline silicon wafers with <100>/<111> orientation, available in prime and test grades with single- or double-side polishing. They meet device development, dummy wafer and process verification needs; small-quantity orders are also accepted.

  • 6 in / 8 in / 12 in, <100> or <111>
  • Single- or double-side polished
  • Test grade for process trials at lower cost
Monocrystalline silicon — published specifications
MaterialCzochralski monocrystalline Si
Diameter6 in / 8 in / 12 in
Thickness200–1,000 μm
Orientation<100> / <111> ±0.5°
Type / dopingP-type (B) · N-type (P)
GradePrime · test
SurfaceSingle- or double-side polished
Flatness / TTVPer sample

Fused quartz — published specifications
MaterialFused silica, JGS1 / JGS2 / JGS3
DimensionUp to 310 × 310 mm
Thickness0.5–20 mm
Tolerance±0.05 mm
Surface finishRa ≤ 0.01 μm polished, or fine ground
Transmission> 90 % over 250–2,000 nm (JGS1)
OH content< 10 ppm (JGS1) · 100–200 ppm (JGS2)
EdgeFine ground, chamfer optional
04 · Fused quartz

Fused quartz

JGS1, JGS2 and JGS3 fused quartz plates, windows and discs with a dimensional tolerance of ±0.05 mm; JGS1 offers transmittance >90% in the deep-UV range. Suitable for optical inspection and precision instruments, with beveling, holes and steps available per drawing.

  • JGS1, JGS2 and JGS3 in stock sizes
  • ±0.05 mm on dimension, lapped flat
  • Holes, steps and chamfers on request

05 · Alumina ceramics

Alumina ceramics

95% and 99% alumina substrates and wear parts, 0.25–10 mm thick, with flatness ≤0.02 mm and flexural strength ≥300 MPa, sliced and lapped to the required thickness per drawing. Widely used in electrical insulation and wear-resistant structural components.

  • 95 % and 99 % purity grades
  • 0.25 mm to 10 mm, flat within 0.02 mm
  • Lapped or polished faces, edges as drawn
Alumina ceramics — published specifications
MaterialAl₂O₃ 95 % / 99 %
DimensionUp to 200 × 200 mm
Thickness0.25–10 mm
Tolerance±0.02 mm
Flatness≤ 0.02 mm
Surface finishRa ≤ 0.4 μm lapped
Density≥ 3.8 g/cm³
Flexural strength≥ 300 MPa
06 · Custom slicing

Custom slicing

Beyond standard products, the company accepts custom slicing of GaAs, GaN, glass, piezoelectric ceramics and non-standard geometries. Customers simply provide drawings and target tolerances for evaluation; new materials can be validated by sample slicing before mass production.

  • GaAs, GaN, glass, piezoceramics and non-standard shapes
  • Drawing and target tolerance are enough for an assessment
  • New materials validated by sample slicing first
Custom slicing — what to send
MaterialsGaAs, GaN, glass, piezoceramics, others on request
GeometryRectangles, rounds, windows, non-standard shapes
TolerancePer drawing; we confirm what routine production holds
ValidationSample slicing before mass production
At a glance

Five material families, one table

A condensed version of the tables above — useful when the question is which material, not which size.

Material comparison — routine production values
Material Format Thickness Tolerance Typical use
SapphireWafers, 310 × 310 sheet700 / 1,000 μm±3 μmLED substrates, covers
Silicon carbide6 in / 8 in wafers350 / 500 μmPer samplePower devices
Silicon6 / 8 / 12 in wafers200–1,000 μmPer sampleDevice development
Fused quartzSlides, windows, discs0.5–20 mm±0.05 mmOptics, inspection
Alumina ceramicSubstrates, wear plates0.25–10 mm±0.02 mmInsulation, wear parts

Need a specification we have not listed?

Send the drawing, the material and the inspection criteria; where a tolerance is beyond the line, we say so before you order.